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D-Sputter

D-Sputter

applications

  • Al, Cu, Ti, Cr, etc

specification

  • Substrate Rotation ( 1~10 rpm )
  • Deposition Uniformity : <5%
  • Substrate Heating : Up to 500℃
  • Heater Uniformity : <5%

System Configuration

  • Industrial Tool
  • Mobile Phone Case
  • Decoration Coating